In Situ Wired Wafer Temperature Measurement

Instrumented wafers are used in semiconductor processing equipment where it is critical to understand and control the temperature at the wafer surface.

NTC Wafer In Situ Wired Wafer Temperature Me asurement system provides high-precision and reliable wafer temperature measurement and monitoring methods to improve process equipment performance, quality and yield.

Instrumented wafers are used in semiconductor processing equipment where it is critical to understand and control the temperature at the wafer surface. TC Wafer In Situ Wired Temperature Measurement Systems are commonly used for applications such as rapid thermal processing (RTP), rapid thermal annealing (RTA), post exposure bake (PEB), chemical vapor deposition (CVD), physical vapor deposition (PVD), ION implantation, solar cells and many other heat-driven processes.