In Situ Wired Wafer Temperature Measurement

RTD Wafer In Situ Wired Wafer Temperature Measurement

Instrumented wafers are used in semiconductor processing equipment where it is critical to understand and control the temperature at the wafer surface.

Inquiry now

Related Products

RTD Wafer In Situ Wired Wafer Temperature Measurement

Instrumented wafers are used in semiconductor processing equipment where it is critical to understand and control the temperature at the wafer surface.

NTC Wafer In Situ Wired Wafer Temperature Measurement

NTC Wafer In Situ Wired Wafer Temperature Me asurement system provides high-precision and reliable wafer temperature measurement and monitoring methods to improve process equipment performance, quality and yield.

TC WAFER In Situ Wired Wafer Temperature Measurement

Instrumented wafers are used in semiconductor processing equipment where it is critical to understand and control the temperature at the wafer surface. TC Wafer In Situ Wired Temperature Measurement Systems are commonly used for applications such as rapid thermal processing (RTP), rapid thermal annealing (RTA), post exposure bake (PEB), chemical vapor deposition (CVD), physical vapor deposition (PVD), ION implantation, solar cells and many other heat-driven processes.

Subscribe our newsletter

Please Read On, Stay Posted, Subscribe, And We Welcome You To Tell Us What You Think.

submit

Hefei Zhice Electronics Co., Ltd., established in 2003, is a high-tech enterprise and a provincial-level "specialized, specialized and innovative" enterprise. The company is located in the Science and Technology Industrial Park of the National High-tech Industrial Development Zone in Hefei City,